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プラズマ/プロセスの原理 / Michael A. Lieberman, Allan J. Lichtenberg著 ; 佐藤久明訳
プラズマ プロセス ノ ゲンリ

Publisher 東京 : EDリサーチ社
Year 2001.11
Codes ID=2000962381 NCID=BA54690460

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Language Japanese
Size xxi, 430p : 挿図 ; 26cm
Other titles original title:Principles of plasma discharges and materials processing
Notes 監修 堀勝
参考文献: p419-423
Authors *Lieberman, M. A. (Michael A.)
Lichtenberg, Allan J
Subjects LCSH:Plasma dynamics
LCSH:Thin films -- Surfaces  All Subject Search
LCSH:Plasma etching
LCSH:Plasma chemistry
Classification NDC8:427.6
LCC:QC718.5.D9
DC20:530.4/4
Vol PRICE:9500円+税

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Eng General Lib, Open Stacks (Japanese Books)
530.44/LIE 3570629025

2001

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